The statistical radial distribution of energy deposited by inelastic collision of photoelectrons in resist is plotted. Monte Carlo simulation is used. The energy deposition represents the resist absorption below the surface.
(Ref: M. Kotera ''et al.'', Jap. J. Appl. Phys. vol. 47, pp. 4944-4949 (2008). The statistical radial distribution of energy deposited by inelastic collision of photoelectrons in resist is plotted. Monte Carlo simulation is used. The energy deposition rep)